Home Categories Chemical Reagents 1,3,5,7-Tetramethylcyclotetrasiloxane
A0833850

1,3,5,7-Tetramethylcyclotetrasiloxane , 97% , 2370-88-9

Synonym(s):
1,3,5,7-Cyclotetra(methylsiloxane);1,3,5,7-Tetramethylcyclotetrasiloxane;TMCTS

CAS NO.:2370-88-9

Empirical Formula: C4H16O4Si4

Molecular Weight: 240.51

MDL number: MFCD00039567

EINECS: 219-137-4

Pack Size Price Stock Quantity
5g RMB47.20 In Stock
25g RMB111.20 In Stock
100g RMB383.20 In Stock
500g RMB1439.20 In Stock
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Update time: 2022-07-08

PRODUCT Properties

Melting point: −69 °C(lit.)
Boiling point: 134 °C(lit.)
Density  0.986 g/mL at 25 °C(lit.)
vapor pressure  0.05-479Pa at 20℃
refractive index  n20/D 1.387(lit.)
Flash point: 76 °F
storage temp.  2-8°C
form  liquid
Specific Gravity 0.991
color  Colorless to Almost colorless
Water Solubility  Miscible with most organic solvents. Immiscible with water.
Sensitive  Moisture Sensitive
Hydrolytic Sensitivity 3: reacts with aqueous base
BRN  1787074
InChIKey BQYPERTZJDZBIR-UHFFFAOYSA-N
LogP -2.4-5.54 at 25℃

Description and Uses

2, 4, 6, 8-TETRAMETHYLCYCLOTETRASILOXANE can be used as the precursor for the deposition of polysiloxane, cyclic siloxane, silicon dioxide, and gate dielectrics in thin-film transistors (TFT) (for example, for the preparation of ultralow dielectric constant pSiCOH film), and is a component of photochemically formed SiOX monolayers on TiO. It is a good impregnant of photoelectric material. It can be used for the manufacturing of modified siloxane with defined hydrogen content and chain quality.

2,4,6,8-Tetramethylcyclotetrasiloxane can occur addition reaction with unsaturated alkenes, so it’s utilized widely to synthesize variety functional reactive silicone fluids which is used to form silicone block copolymer, or used as crosslinker of vinyl addition silicone rubber. Tetramethyl-cyclotetrasiloxane is a good impregnant of photoelectric material. It is used to manufacture of modified siloxane with defined hydrogen content and chain quantity. It is also used in production of silicone polymers and acts as a precursor for the deposition of polysiloxane, cyclic siloxane, silicon dioxide, oxycarbide thin films with low dielectric constant for microelectronics and semiconductors.

Safety

Symbol(GHS) 
GHS02,GHS07
Signal word  Warning
Hazard statements  H319-H226
Precautionary statements  P280a-P305+P351+P338-P501a-P210-P233-P240-P241+P242+P243-P264-P280-P303+P361+P353-P305+P351+P338+P337+P313-P370+P378-P403+P235-P501
Hazard Codes  Xi
Risk Statements  10-36
Safety Statements  16-26-36
RIDADR  UN 1993 3/PG 3
WGK Germany  3
10-21
TSCA  Yes
HazardClass  3
PackingGroup  III
HS Code  29319090

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